Control of Wafer Scanners: Methods and Developments

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2020 American Control Conference Denver, CO, USA, July 1-3, 2020 Control of Wafer Scanners: Methods and Developments M.F. Heertjes, H. Butler, N.J. Dirkx, S.H. van der Meulen ∗ , and R. Ahlawat † , and , K. O’Brien, J. Simonelli, K-T. Teng, Y. Zhao ‡ ∗ ASML, Veldhoven, The Netherlands, email: marcel.heertjes, hans.butler, nic.dirkx, stan.van.der.meulen {@asml.com}…

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• Yash Karthik

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