λ/12 Super Resolution Achieved in Maskless Optical Projection Nanolithography for Efficient Cross-Scale Patterning | Nano Letters | ACS Publications
Yu-Huan Liu, Yuan-Yuan Zhao, Feng Jin, Xian-Zi Dong, Mei-Ling Zheng, Zhen-Sheng Zhao, Xuan-Ming Duan; λ/12 Super Resolution Achieved in Maskless Optical Projection Nanolithography for Efficient Cross-Scale Patterning. Nano Lett. 12 May 2021; 21 (9): 3915–3921. https://doi.org/10.1021/acs.nanolett.1c00559 Download citation file: The emerging demand for device miniaturization and integration prompts the patterning technique of micronano-cross-scale structures as an urgent desire. Lithography, as a sufficient patterning technique, has been playing an important role in achieving functional micronanoscale structures for decades. As a promising alternative, we have proposed and demonstrated the maskless optical projection nanolithography (MLOP-NL) technique for efficient cross-scale patterning. A minimum feature size of 32 nm, which is λ/12 super resolution breaking the optical diffraction limit, has been achieved by a single exposure. Furthermore, multiscale two-dimensional micronano-hybrid